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KMID : 0385519980110040311
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Analytical Science & Technology
1998 Volume.11 No. 4 p.311 ~ p.315
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Analysis of Ultra Pure Sulfuric Acid for Semiconductor Using High Resolution ICP - MS
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허용우/Heo YW
길준잉/임흥빈/Gil JI/Lim HB
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Abstract
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Ultra trace metal impurities of high-purity sulfuric acid for semiconductor process have been determined in the concentration of lower than ppb (ng/g) level using high resolution inductively coupled plasma mass spectrometer (HR-ICP-MS).The acid samples were evaporated and concentrated by the factor of 20. No clement in the acids exceeded 1ppb level and most of the clements were determined below 10ppt (pg/g). Elements without spectral interference in mass spectrum, such as In, V, Mn, etc, were determined in the concentration of below 1ppt level The recoveries in the range of 720% to 127.2% for 0.5ppb spiked sample were obtained.
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